META 2021, META'12

Font Size: 
Simultaneous multi-directional plasma etching for creating three-dimensional photonic nanostructures
Katsuyoshi Suzuki, Kenji Ishizaki, Susumu Noda

Last modified: 2012-01-03

Abstract


We investigate an approach for simply creating three-dimensional (3D) photonic nanostructures based on a simultaneous, multi-directional etching technique. By only single-step simultaneous etching, 3D photonic bandgap crystals, which possess periodic arrangements of silicon in three dimensions, are successfully realized. Fabricated structures show high reflectance (>95%) and strong attenuation of transmittance (-15dB). These results suggest that our proposed technique promises to open up an easy route toward creation of high-quality 3D photonic nanostructures.

Keywords


photonic crystals