A study on the multiple-exposure nanosphere-lithography process for two-dimensional complexed photonic crystals

Jong-Bin Yeo; Hyun-Yong Lee

META Conference, META'12

Jong-Bin Yeo, Hyun-Yong Lee

Last modified: 2012-01-03

Abstract

Arrays of two-dimensional complexed photonic crystals (2D-cPCs) have been fabricated by a multiple-exposure nanosphere-lithography (MENSL) method utilizing a self-assembed nanosphere as a lens mask and an expanded He-Cd laser. The nanospheres were self-assembled on a photo-resist(PR). The nanospheres were self-assembled on a PR. Then, the masked PR was multi-exposed with a changing rotation angle(q) and tilt angle (g). The scanning electron microscopy reveals that MENSL is a useful tool for fabricating cPCs with various lattice structures.

Keywords

complexed photonic crystals; MENSL; multiple-exposure nanosphere lithography