META Conference, META'12

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Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Resonant SEIRA Substrates
Jun Zhao, Stefano Cataldo, Frank Neubrech, Bettina Frank, Chunjie Zhang, Paul V Braun, Harald Giessen

Last modified: 2012-01-06

Abstract


We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials, and measure their infrared optical properties. This novel substrate is applied for antenna-enhanced SEIRA measurement using ODT and deuterated ODT, which demonstrates easy adjustability of our material to the vibrational modes.